Electrostatic Photoresist "Elecoat EU-XC Series"
Formation of resist by electrophoretic method
It is a negative-type photoresist solution. The resist is formed using an electrophoretic method.
- Company：シミズ
- Price：Other
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Negative-type electrostatic photoresist
Electrodeposition process of negative-type photoresist to achieve high-precision plating areas.
The Erecote EU-XC process is a photoresist electrophoretic process that achieves high-precision partial plating on uneven surfaces and three-dimensional shapes. This electrophoretic resist has excellent chemical resistance and can be used as a resist for silver cyanide plating, as well as for gold plating and copper sulfate plating. It features excellent edge coverage and achieves high-precision developability. It is a negative-type electrophoretic photoresist that enables precise partial plating and can also be used as an etching resist.
- Company：シミズ
- Price：Other
![[Developed Product] Negative Type Anionic Electrophoretic Photoresist](https://image.mono.ipros.com/public/product/image/7c6/2001425387/IPROS60122774361252602580.png?w=280&h=280)
[Developed Product] Negative Type Anionic Electrophoretic Photoresist
It is a negative-type anion electrostatic photoresist!
Since it is an anionic electrophoretic negative-type photoresist, the developer and stripping solution will be alkaline. The developer and stripping solution are not specialized products.
- Company：ハニー化成
- Price：Other
